Multi-Field Coupling Mechanism of Electrolytic In-process Dressing- Ultrasonic Honing System

Jicai Kuai

Abstract


This paper proposes the ELID (Electrolytic in Process Dressing) ultrasonic honing system, and conducts simulation for the solution - acoustic coupling mechanism of electrolyte between the anion and cathode of ELID ultrasonic honing system. Meanwhile, a comparative experiment is carried out for the ultrasonic honing and ordinary honing. The simulation results show that there is no obvious increase of the coupling speed of the system’s electrolyte, but the rapid change of local speed, which will accelerate the electrolyte renewal around the electrode, thereby intensifying the mass transfer of reactive ion of the electrochemical double layer, increasing the updating speed of ion concentration and speeding up the electrode reaction process; the intense variations of coupling pressure further enhances the updating speed of the electrolyte; Then the electrolytic parameters, ultrasound parameters and honing parameters obtained by simulation are respectively used to conduct experiments of ELID-ultrasound honing, ultrasound honing and traditional honing for ZrO2 ceramic. The comparative experiment results show that the machining accuracy of ELID-ultrasonic honing is 10 times of the traditional honing and twice of the ultrasonic honing; the new acoustic system adopted in ELID-ultrasound honing system reduces the amplitude, so the processing efficiency increase is not significant. This ELID-ultrasonic honing system is more suitable for the ultra-precision honing of certain difficult-to-cut materials.

 

DOI: http://dx.doi.org/10.11591/telkomnika.v11i7.2865


Keywords


Electrolytic In-process Dressing; Ultrasonic Honing; Multi-field Coupling; Numerical Simulation

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Indonesian Journal of Electrical Engineering and Computer Science (IJEECS)
p-ISSN: 2502-4752, e-ISSN: 2502-4760
This journal is published by the Institute of Advanced Engineering and Science (IAES) in collaboration with Intelektual Pustaka Media Utama (IPMU).

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